NanoScribe QuantumX Two-Photon Nanoscale 3D Printing System

Model: QuantumX

Category: Semiconductor Package Equipment

Booth No: L327

Characteristic

The NanoScribe QuantumX is a two-photon nanoscale 3D printing system designed for ultra-high precision fabrication. Utilizing proprietary 2PP (Two-Photon Polymerization), 2PGL (Two-Photon Grayscale Lithography), and A2PL (Adaptive Two-Photon Lithography) technologies, it achieves nanometer-scale resolution with exceptional control over complex 3D structures. Its advanced optical and motion control systems ensure high performance and stability, making it an ideal choice for applications in micro-optics, microfluidics, biomedical engineering, silicon photonics, PWB (Printed Wiring Boards), and quantum technologies.

Key Features

Proprietary 2PP / 2PGL / A2PL technology: Breakthrough two-photon 3D printing capabilities
Ultra-high resolution: Minimum feature size <100 nm, linewidth <200 nm
High-speed printing: Scanning speed up to 200 mm/s
Large-scale structuring: Maximum printing area of 50 × 50 mm²
Versatile material compatibility: Supports a variety of photoresins and hybrid materials
Precision alignment: Built-in alignment mechanisms for MEMS, micro-optics, silicon photonics, and chip integration
Automated workflow: CAD import and auto-focus support for enhanced manufacturing efficiency
QuantumX provides outstanding 3D nanoscale printing capabilities, making it a powerful tool for scientific research and industrial applications, enabling breakthroughs in precision optics, biomedical microstructures, microfluidics, silicon photonics, and PWB microfabrication.