Large‐Area Scatterometry for Nanoscale Metrology
Category: Micro LED Production Manufacturing Equipment
Exhibitor: TITAN ELECTRO-OPTICS CO., LTD.
Booth No: N610
Characteristic
Fast and non‐destructive metrology techniques with the possibilityof critical dimensionanalysis of nanostructures at single nanometer accuracy are critical for photonics and electronics industries.TeraNova’squalityinspectiontechnology isbasedonadistinctapproachwherethesampleisilluminated isbasedonadistinctapproachwherethesampleisilluminated withacollimatedlightatawell‐definedincidenceanglethrough anobjective lens.With this technique, diffractedorders are imagedforeachangleofincidence.Byanalyzingtheintensityof theseorders as a functionof theangleof incidencewecan determinetheopticalperformanceof thesamplesandextract theirgeometricalparameters theirgeometricalparameters.
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