A Solvent-Free Low Viscous Photo-NIL Resist
Model: mr-UVCur26SF
Category: Industrial Material - Chemical Engineering
Exhibitor: ALL RADIANCE OPTRONICS CO., LTD
Booth No: M301
Characteristic
Applications
– Step&Repeat NIL process
– Large-area nanostructuring of flexible substrates
– Continuous roll-to-roll (R2R ) Photo-NIL processes
– High volume manufacturing of
‧ Antireflective coatings
‧ (Super)Hydrophobic patterns on flexible substrates
‧ Wire-grid polarizers
Unique Features
– Organic, photo-curable nanoimprint resist for inkjet dispensing
– Excellent imprint characteristics
– Compatibility to various mold materials: Ni, Si, OrmoStampR
– High stability of the cured patterns
– Excellent dry etch resistance for pattern transfer
– Transparent for UV/vis > 350nm
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