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A Solvent-Free Low Viscous Photo-NIL Resist

Model: mr-UVCur26SF

Category: Industrial Material - Chemical Engineering

Exhibitor: ALL RADIANCE OPTRONICS CO., LTD

Booth No: M301

Characteristic

Applications
– Step&Repeat NIL process
– Large-area nanostructuring of flexible substrates
– Continuous roll-to-roll (R2R ) Photo-NIL processes
– High volume manufacturing of
‧ Antireflective coatings
‧ (Super)Hydrophobic patterns on flexible substrates
‧ Wire-grid polarizers

Unique Features
– Organic, photo-curable nanoimprint resist for inkjet dispensing
– Excellent imprint characteristics
– Compatibility to various mold materials: Ni, Si, OrmoStampR
– High stability of the cured patterns
– Excellent dry etch resistance for pattern transfer
– Transparent for UV/vis > 350nm

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