Compound Semiconductor Etching System
Category: Equipment and Materials
Exhibitor: HERMES-EPITEK CORP.
Booth No: M412
Characteristic
Hermes-Epitek compound semiconductor Etching system provides a reliable and low-cost solution for the manufacture of power device and RF device
This product is based on 12-inch advanced semiconductor process equipment as the design blueprint, drawing on 12-inch advanced semiconductor processing experience, creating a new generation of 6/8 inch semiconductor etching equipment system. Therefore, the system has many process tunning functions, which can cope with various critical specifications of process.
In addition, the process flow of this etching system is to take the Clean mode, after each major etching process ends, the chamber will be proceed the clean recipe after wafer exiting, commonly known as WLDC ( Wafer less dry clean), so the process chamber can keeping clean for a long time, extend the PM cycle time, and maintain a stable process capability. The process chamber has a short maintenance time and a short recovery time.
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