MOCVD System
Category: Equipment and Materials
Exhibitor: HERMES-EPITEK CORP.
Booth No: M412
Characteristic
With over 40 years non-stop semiconductor experiences, Hermes Epitek devoted ourselves into the development of 1st Taiwan-made MOCVD system.
Strengths and advantages of our MOCVD system:
￭ Fully-integrated, modulized product line, which can satisfy the growth and applications of Niride, GaN-on-Si, GaAs, and InP
￭ Wafer facedown loading, reducing in-film particle formation for better yield control
￭ Gear drove rotation and revolution system, to achieve an astonishing uniformity and maintain high reliability
￭ 8"x6 , 6"x9, 4"x18 wafer output, maximizing production capacity
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