Single Wafer Wet Process Equipment
Model: Polar 2004/Polar 3004
Category: Semiconductor Package Equipment
Exhibitor: SCIENTECH CORPORATION
Booth No: N303
Characteristic
Process individual wafers for high-output quality.
Applicable to high Warpage wafer.
Applicable to variable wafer Size 6’-12’.
Multi-layer process/etching.
High chemical recycle.
For throughput chamber can be added 2-12.
Highly customizable according to requirements.
Comply SEMI-S2 guidline
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