PLASUS EMICON Plasma Process Monitoring and controller
Model: EMICON MC/SA
Category: Related Equipment/Materials/Technology
Exhibitor: APPLIED OPTIVAC TECHNOLOGY, INC.
Booth No: M620
The advanced PEM (EMICON: EMISSION CONTROLLER) no more uses in accurate narrow-band-pass filter, but linear CCD instead, to increase spectra resolution. Not only is the accuracy of plasma line higher, but also the noises in the vicinity of plasma lines or bands can be separate (S/N ratio is much higher) to give a higher control range with high precision. Although the costs for new broad-band linear CCD type PEM system is higher, better performance and higher reliability get cost-down and higher yield in the production line that save a lot back in the real mass production in a short time.
The followings are key features in plasma process:
1. quickly finding and stabilizing the setpoint in hysteresis region of a reactive sputtering
2. increase the deposition rate
3. simultaneously proceeding online QA/QC via ratio technique plus setpoint functions.